Internet Archive Search: subject:"semiconductor manufacturing"

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	MIT OCW: 2.830J/6.780J/ESD.63J Control of Manufacturing Processes, Spring 2008 - Duane Boning, David Hardt This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered... Keywords: Process control; manufacturing process; discrete system feedback control theory; empirical and adaptive modeling; off-line optimization; statistical process control; real-time control; 2.830J; 2.830; one-factor-at-a-time; robustness; Shewhart Hypothesis; semiconductor manufacturing Downloads: 1,407
	MIT2-830JS08 - MIT OpenCourseWare This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered... Keywords: process control; manufacturing process; discrete system; feedback control theory; empirical; adaptive; modeling; off-line optimization; statistical process control; real-time control; 2.830J; 2.830; robustness; Shewhart Hypothesis; semiconductor manufacturing Downloads: 11,032